The Introduction to PICs Design course offers an intensive academic exploration of the lifecycle of Photonic Integrated Circuits (PICs), specifically tailored for international students. The curriculum bridges the gap between theoretical semiconductor physics and practical circuit-level engineering on Silicon Photonics and III-V platforms. Students are introduced to the fundamental principles of integrated optics—including light propagation in planar and strip waveguides—before advancing device-level modeling and circuit-level integration.
A core component of the course is the application of numerical methods and simulation techniques using professional EDA tools, including Ansys Lumerical, Optiwave (FDTD, varFDTD, EME), and Nazca Design. The syllabus covers the essential stages of the design flow, from initial element-level simulations to complex mask layout design and topography. Participants will gain insight into the industrial ecosystem of chip development flow, including the fabless model, the role of Process Design Kits (PDKs), and the integration of micro-optical elements like metalenses. By the end of the course, students will have a clear, structured view of the design and verification process, with a strong awareness of the manufacturing-related constraints and material platforms—such as SOI, SiN, and InP—required for contemporary integrated photonic systems.

Hour breakdown for this module across online and onsite delivery formats.
20 places available · Hybrid format · Warsaw University of Technology